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Nanofabrication & Site-Specific Preparation
Focused Ion Beam (FIB) Micromachining & Sample Preparation
Bridging FIB Precision with Industrial Decision-Making
Advanced FIB Capabilities
Our Focused Ion Beam (FIB) platform enables site-specific micromachining, precision cross-sectioning, TEM lamella preparation, and nanoscale material modification with exceptional control. From complex semiconductor devices to advanced alloys and multilayer coatings, we deliver high-accuracy material removal and structural exposure at nanometer resolution—supporting correlative microscopy and multi-technique characterization workflows.
Site-Specific Milling
TEM Lamella Preparation
Cross-Sectioning
3D Tomography
Expert Sample Preparation Workflow
- Assessment & Strategy: Defining regions of interest, material sensitivity, and preparation pathway.
- Protective Deposition: Ion- or electron-beam-assisted deposition to preserve surface integrity.
- Precision Milling: Progressive thinning with controlled beam current and angle.
- Final Polishing: Low-kV cleaning to minimize amorphization and ion damage.
Manufacturing–Microstructure Correlation
| Material Domain | FIB Insight | Optimization Impact |
|---|---|---|
| Semiconductors | Contact voids, interconnect delamination | Process tuning for yield and reliability |
| Coatings | Interface adhesion and layer uniformity | Improved coating durability |
| Composites | Fiber–matrix bonding | Enhanced mechanical performance |
High-Stakes Insight
Early Detection
Root Cause Analysis
Direct visualization of failure origins across layers and interfaces.
From Failure Analysis to Future Material Systems
FIB Precision Access to the Nanoscale
Focused Ion Beam (FIB) Micromachining enables site-specific sectioning, nanometer-scale material removal, and high-fidelity sample preparation—revealing subsurface structures that conventional methods cannot reach.